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Room temperature fabricated flexible NiO/IGZO pn diode under mechanical strain

Identifieur interne : 000583 ( Main/Repository ); précédent : 000582; suivant : 000584

Room temperature fabricated flexible NiO/IGZO pn diode under mechanical strain

Auteurs : RBID : Pascal:13-0254947

Descripteurs français

English descriptors

Abstract

Flexible electronic devices fabricated on plastic substrates require semiconductors, which can be deposited at low temperatures. While Indium-Gallium-Zinc-Oxide (IGZO) is a promising n-type oxide semiconductor, a p-type oxide semiconductor with similar performance is currently not available. Here, the room temperature deposition of nickel oxide (NiO) acting as a p-type oxide semiconductor on a flexible plastic foil is described. NiO exhibits a carrier density of +1.6 × 1017 cm-3 and a Hall mobility of 0.45 cm2/Vs. p-type NiO is combined with n-type IGZO to fabricate flexible pn diodes on a free-standing polyimide substrate. The diodes show an ideality factor of ≃3.2 and an on-off current-ratio of ≃104. The NiO/IGZO diodes stay fully operational when exposed to tensile or compressive mechanical strain of 0.25%, induced by bending to a radius of 10 mm. In addition, a 50 Hz AC signal was rectified using a flexible diode while flat and bent.

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Pascal:13-0254947

Le document en format XML

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<term>Flexible structure</term>
<term>Gallium oxide</term>
<term>Hall mobility</term>
<term>Ideality</term>
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<term>Low temperature</term>
<term>Mechanical deformation</term>
<term>Nickel oxide</term>
<term>On off effect</term>
<term>Performance evaluation</term>
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<term>Polyimide</term>
<term>Room temperature</term>
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<term>Oxyde d'indium</term>
<term>Oxyde de gallium</term>
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<div type="abstract" xml:lang="en">Flexible electronic devices fabricated on plastic substrates require semiconductors, which can be deposited at low temperatures. While Indium-Gallium-Zinc-Oxide (IGZO) is a promising n-type oxide semiconductor, a p-type oxide semiconductor with similar performance is currently not available. Here, the room temperature deposition of nickel oxide (NiO) acting as a p-type oxide semiconductor on a flexible plastic foil is described. NiO exhibits a carrier density of +1.6 × 10
<sup>17 </sup>
cm
<sup>-3</sup>
and a Hall mobility of 0.45 cm
<sup>2</sup>
/Vs. p-type NiO is combined with n-type IGZO to fabricate flexible pn diodes on a free-standing polyimide substrate. The diodes show an ideality factor of ≃3.2 and an on-off current-ratio of ≃10
<sup>4</sup>
. The NiO/IGZO diodes stay fully operational when exposed to tensile or compressive mechanical strain of 0.25%, induced by bending to a radius of 10 mm. In addition, a 50 Hz AC signal was rectified using a flexible diode while flat and bent.</div>
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<sup>17 </sup>
cm
<sup>-3</sup>
and a Hall mobility of 0.45 cm
<sup>2</sup>
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<sup>4</sup>
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